eesti teaduste
akadeemia kirjastus
SINCE 1952
Proceeding cover
of the estonian academy of sciences
ISSN 1736-7530 (Electronic)
ISSN 1736-6046 (Print)
Impact Factor (2022): 0.9
Mechanical and tribological properties of 100-nm thick alumina films prepared by atomic layer deposition on Si(100) substrates; pp. 126–130

Asad Alamgir, Andrei Bogatov, Maxim Yashin, Vitali Podgursky

The study investigates mechanical and tribological properties of alumina (Al2O3) films prepared on Si(100) substrates. The 100-nm thick films were deposited by atomic layer deposition. Nanoindentation and nano-scratch tests were performed with Berkovich and sphero-conical diamond indenters, respectively. Energy-dispersive X-ray spectroscopy and optical and scanning electron microscopy were used to analyse the surface morphology and chemical composition of the thin films. X-ray diffraction was used to characterize their crystal structure. Crystallization was found to start at 1100 °C after 3 hours of annealing. The hardness and tribological properties of the alumina films were influenced by the substrate in nanoindentation and nano-scratch tests. Within the relatively low load range (5–50 mN), the coefficient of friction of Si and alumina against diamond depended on the load, most likely due to a change in the elastic/plastic deformation behaviour within the Si substrate.


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