ESTONIAN ACADEMY
PUBLISHERS
eesti teaduste
akadeemia kirjastus
cover
Proceedings of the Estonian Academy of Sciences. Physics. Mathematics
Atomic layer deposition: a key technology for the controlled growth of oxide thin films for advanced applications; pp. 266–276
PDF | https://doi.org/10.3176/phys.math.2003.3.03

Author
Lauri Niinistö
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