ESTONIAN ACADEMY
PUBLISHERS
eesti teaduste
akadeemia kirjastus
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Proceedings of the Estonian Academy of Sciences. Physics. Mathematics
Effects of growth temperature on the properties of HfO2 films grown by atomic layer deposition; pp. 308–320
PDF | https://doi.org/10.3176/phys.math.2003.3.07

Authors
Giovanna Scarel, Claudia Wiemer, Sandro Ferrari, Grazia Tallarida, Marco Fanciulli
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